Taoyuan, Taiwan

Chen-Wen Chiu

USPTO Granted Patents = 6 

Average Co-Inventor Count = 3.9

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2015-2025

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6 patents (USPTO):Explore Patents

Title: Innovator Chen-Wen Chiu: Pioneering Patents in Photosensitive Resin Technologies

Introduction

Chen-Wen Chiu, an accomplished inventor based in Taoyuan, Taiwan, has significantly contributed to the field of material science with a focus on photosensitive resins. With a total of five patents to his name, Chiu is recognized for his innovative solutions that enhance various applications, particularly in optics and imprinting technologies.

Latest Patents

Chen-Wen Chiu’s latest patents include developments in photosensitive resin compositions and their applications. One notable invention is a photosensitive resin composition for imprinting, which comprises a resin with a molecular weight ranging from 1,000 to 50,000, featuring multiple ethylenically polymerizable groups. Accompanying this composition are a cured article and an optical element designed to optimize performance in various uses. Another significant patent involves a resin composition for filter elements that includes a black coloring agent made from titanium black and carbon black, effectively improving the quality and functionality of filter applications.

Career Highlights

Throughout his career, Chiu has worked with prominent companies such as Echem Solutions Corp. and Advanced Echem Materials Company Limited. His roles at these organizations have been pivotal in driving innovation and refining chemical processes related to photosensitive materials. His expertise and knowledge in resin technology have established him as a trusted figure in the industry.

Collaborations

Collaboration is key to innovation, and Chen-Wen Chiu has worked alongside talented individuals like Yu-Wen Chen and Yi-Lun Chiu. Their collective efforts have enriched Chiu’s research and development pursuits and have fostered a creative environment to innovate new solutions in the realm of photosensitive resins.

Conclusion

In conclusion, Chen-Wen Chiu exemplifies the role of an inventor who not only develops cutting-edge technologies but also fosters collaboration to push the boundaries of material science. With a proven track record of five patents, his work continues to impact the industry positively, laying the groundwork for future innovations in photosensitive resin applications.

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