Chen Hwa

Title: Innovations by Inventor Chen Hwa

Introduction

Chen Hwa is a notable inventor based in Fremont, CA, who has made significant contributions to the fields of electron beam lithography and signal processing. With a total of 2 patents to his name, Hwa's work showcases his expertise and innovative thinking in technology.

Latest Patents

One of Hwa's latest patents is focused on the "Minimization of electron fogging in electron beam lithography." This invention involves a shield assembly designed to reduce electron fogging effects. The shield is strategically placed between the electron beam column final aperture and the beam target. It features multiple vanes with sharp edges that are conically shaped and concentric around the electron beam path. The sharp edges present oblique surfaces angled between 10° and 20° relative to the outer vane surface, effectively directing the electron beam incident point.

Another significant patent by Hwa is the "Wide band video signal denoiser and method for denoising." This invention provides a method and apparatus for high-speed denoising of input signals received by radar warning receiver systems. The system digitizes the input signal into sample windows and utilizes a signal transformation processor that convolves Haar wavelet basis functions across time segments of the input signal. This innovative approach allows for effective noise reduction while preserving essential signal characteristics.

Career Highlights

Throughout his career, Chen Hwa has worked with reputable companies such as Litton Applied Technology and Etec Systems, Inc. His experience in these organizations has contributed to his development as an inventor and has provided him with valuable insights into the industry.

Collaborations

Hwa has collaborated with notable individuals in his field, including Robert Innes and Lee H. Veneklasen. These collaborations have likely enriched his work and expanded his innovative capabilities.

Conclusion

In summary, Chen Hwa is an accomplished inventor whose patents reflect his innovative contributions to technology. His work in electron beam lithography and signal processing demonstrates his commitment to advancing these fields.