Ningbo, China

Chen Hui Wei

This inventor holds 2 USPTO granted patents. Top assignee: Sun Coast Merchandise Corporation. Active years: 2004-2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chen Hui Wei. Retrieved from https://idiyas.com/inventor/chen-hui-wei

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0

Average Co-Inventor Count = 1.0

ph-index = 2

Forward Citations = 15(Granted Patents)


Location History:

  • Ninghai, CN (2004)
  • Ningbo, CN (2005)

Company Filing History:


Years Active: 2004-2005

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2 patents (USPTO):Explore Patents

Title: Innovations by Chen Hui Wei: A Look at His Contributions to Stamp Technology.

Introduction

Chen Hui Wei is an accomplished inventor based in Ningbo, China. He has made significant contributions to the field of stamping technology, holding two patents that showcase his innovative spirit and technical expertise.

Latest Patents

Chen's latest patents include a unique stamper design and a hand stamp. The stamper features a metal plate positioned between a platen and a stamp die, which enhances the imprint quality by providing better support to the stamp die. This innovative design also includes a removable ink pad and a rotatably reversible platen with a cam mechanism. When in the imprint position, the metal platen plate and its adjoining stamp die face downwards, while in the re-inking position, they face upwards. His hand stamp further exemplifies his creativity and dedication to improving stamping technology.

Career Highlights

Chen Hui Wei is currently associated with Sun Coast Merchandise Corporation, where he continues to develop and refine his inventions. His work at the company reflects his commitment to advancing stamping solutions and enhancing user experience.

Conclusion

Chen Hui Wei's contributions to stamping technology through his innovative patents demonstrate his expertise and dedication to the field. His work not only improves existing technologies but also paves the way for future advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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