Company Filing History:
Years Active: 2004
Title: Innovations of Chen-Hao Hsieh: Pioneering Photomask Technologies
Introduction
Chen-Hao Hsieh is an accomplished inventor hailing from Ping Chen, Taiwan, known for his significant contributions to the field of semiconductor manufacturing. With two patents to his name, Hsieh has been instrumental in advancing photomask technologies critical for modern photolithography processes.
Latest Patents
Hsieh's latest patents showcase his expertise in fabricating advanced photomasks. The first invention, "Single trench alternating phase shift mask fabrication," focuses on the innovative method of creating a single-trench alternating phase shift mask (PSM). This process involves a chromium layer patterned over a mask layer and quartz layer, etching these components to accurately produce the intricate designs necessary for semiconductor applications.
The second patent, titled "Process flow and pellicle type for 157 nm mask making," presents a method for forming photomasks and pellicles tailored for photolithography using electromagnetic radiation in specific wavelength ranges. This invention employs advanced techniques, such as gallium ion staining and carbon atom deposition, ensuring the creation of high-quality, precise photomasks suitable for cutting-edge semiconductor processes.
Career Highlights
Hsieh currently works at Taiwan Semiconductor Manufacturing Company (TSMC), a global leader in semiconductor manufacturing. His role in TSMC has allowed him to leverage his innovative ideas to enhance the efficiency and precision of photomask fabrication processes, significantly impacting the semiconductor industry. His work continues to push the boundaries of technology in this rapidly evolving sector.
Collaborations
Throughout his career, Chen-Hao has collaborated with esteemed coworkers such as San-De Tzu and Anthony Yen. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of expertise in semiconductor technologies, leading to the successful development of new fabrication techniques and designs.
Conclusion
In summary, Chen-Hao Hsieh's inventive contributions to the field of semiconductor manufacturing are noteworthy. His patents in photomask technologies demonstrate a commitment to innovation and excellence. As he continues to develop new methods and collaborate with fellow experts, Hsieh is poised to remain a pivotal figure in the advancement of semiconductor manufacturing processes.