Kaifeng, China

Chen Dong

This inventor holds 1 USPTO granted patent and 1 published patent application. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chen Dong. Retrieved from https://idiyas.com/inventor/chen-dong-irieeb33

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Chen Dong and a Method for Manufacturing Thin-Film Devices

Introduction

Chen Dong is an inventor associated with Kaifeng, China. His listed patent concerns a method for manufacturing multiple thin-film devices through a shared coating process.

Latest Patents

Chen Dong’s listed patent is “Method of Manufacturing Thin Film Devices.” It describes applying a solution to one planar substrate, bringing a second substrate into contact with the solution, and sliding the substrates past one another. This motion draws the solution across both surfaces to form separate coatings, which are then dried to produce at least two thin-film devices in one process. The supplied information lists 1 patent for Chen Dong.

Career Highlights

The patent’s central contribution is a process designed to coat two substrates concomitantly. By using adjacent, parallel substrates and their relative movement to distribute the solution, the method provides a way to form coatings on both surfaces within the same manufacturing sequence.

Collaborations

Furui Tan and Wanlong Wang are identified as Chen Dong’s coworkers. The supplied information does not specify their roles in the patent or the manufacturing method.

Conclusion

Chen Dong’s listed invention focuses on producing multiple thin-film devices through a coordinated coating and drying process, with the aim of manufacturing at least two devices concomitantly.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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