Hsinchu, Taiwan

Chen-Chi Wu


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Location History:

  • Hsinchu, TW (2015)
  • Tainan, TW (2022 - 2024)

Company Filing History:


Years Active: 2015-2024

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3 patents (USPTO):Explore Patents

Title: The Innovations of Inventor Chen-Chi Wu

Introduction

Chen-Chi Wu is a notable inventor located in Hsinchu, Taiwan. With a total of three patents to his name, he has made significant contributions to the field of image sensors through innovative technologies.

Latest Patents

Among his latest innovations is the development of a polydimethylsiloxane (PDMS) antireflective layer for image sensors. This technology features a subwavelength, hydrophobic, and antireflective layer designed to enhance light absorption. The PDMS layer is intricately fabricated to include a surface with a variety of nanostructures, such as convex protuberances and concave recesses. These nanostructures are created using a porous anodic aluminum oxide (AAO) template, which employs nanopores to effectively form the desired array. This design ensures that each nanostructure's width is less than the wavelength of incident light aimed at being collected by the image sensor. This innovation increases the angle of incidence for light collection, significantly boosting the quantum efficiency and sensitivity of the image sensor.

Career Highlights

Chen-Chi Wu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading organization in the semiconductor industry. His work at this esteemed company has allowed him to push the boundaries of image sensor technology, leading to advancements that have profound implications in various applications.

Collaborations

Throughout his career, Chen-Chi Wu has collaborated with esteemed colleagues, including Yi-Ming Lin and Chen-Kuei Chung. Their combined expertise and innovative approaches have further enhanced their research and development efforts in the field.

Conclusion

In summary, Chen-Chi Wu is a prominent inventor whose work in developing advanced polydimethylsiloxane antireflective layers for image sensors marks him as a key contributor to technological advancements in the semiconductor industry. His innovative spirit and teamwork with fellow researchers position him as a significant figure in the pursuit of enhanced image sensor performance.

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