Taoyuan, Taiwan

Che Wei Chang

USPTO Granted Patents = 1 

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Che Wei Chang: Innovator in Photosensitive Insulated Resin Technology

Introduction

Che Wei Chang is a notable inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of materials science, particularly in the development of photosensitive insulated resin compositions. His innovative work has led to the creation of a patented technology that enhances the production of insulated films.

Latest Patents

Che Wei Chang holds a patent for a "Photosensitive insulated resin composition and method of producing insulated film thereof." This invention provides a unique photosensitive insulated resin composition that can be evenly coated on a substrate surface to form a fully covered insulated film. The composition includes an alkali-soluble resin containing a phenolic group, a quinone diazide-group-containing compound, a crosslinking agent, and a combination of high-boiling-point and low-boiling-point solvents. The specific boiling point ranges and ratios of these solvents are critical to the effectiveness of the insulated film.

Career Highlights

Che Wei Chang is currently employed at Echem Solutions Corp., where he continues to innovate and develop new materials. His work at the company has positioned him as a key player in advancing resin technology. His dedication to research and development has resulted in practical applications of his inventions in various industries.

Collaborations

Che Wei Chang collaborates with his coworker, Ming Che Chung, to further enhance their research and development efforts. Their teamwork has been instrumental in driving innovation within their projects.

Conclusion

Che Wei Chang's contributions to the field of photosensitive insulated resin technology exemplify the impact of innovative thinking in materials science. His patented work not only showcases his expertise but also highlights the importance of collaboration in achieving technological advancements.

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