Ames, IA, United States of America

Che-Ting Chan


Average Co-Inventor Count = 4.2

ph-index = 2

Forward Citations = 87(Granted Patents)


Company Filing History:


Years Active: 1994-1995

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2 patents (USPTO):Explore Patents

Title: Innovative Contributions of Che-Ting Chan in Photonic Structures

Introduction: Che-Ting Chan, an accomplished inventor based in Ames, IA, has made significant strides in the field of photonic structures. With a total of two patents to his name, his work demonstrates a commitment to advancing technology and enhancing material applications.

Latest Patents: Che-Ting Chan's latest patents include a Periodic Dielectric Structure for Production of Photonic Band Gap and A Method for Fabricating a Periodic Dielectric Structure which Exhibits a Photonic Band Gap. The first patent outlines a novel periodic dielectric structure capable of producing a photonic band gap, constructed from multiple layers of rods with varying refractive indices and orientations. This design leads to a four-layer periodicity, resulting in a three-dimensional structure that effectively exhibits a photonic band gap. The second patent details a method for fabricating this structure, which involves the precision alignment of wafers and the systematic layering of rods, allowing for a practical construction of photonic devices.

Career Highlights: Che-Ting Chan is associated with the Iowa State University Research Foundation, Inc., where he engages in cutting-edge research. His patents reflect his deep understanding of dielectric materials and their applications in photonics, solidifying his reputation in the field of technology innovation.

Collaborations: Throughout his career, Che-Ting Chan has collaborated with notable colleagues such as Kai-Ming Ho and Costas M Soukoulis. These collaborations have enabled the exchange of ideas and expertise, further enhancing the development of innovative photonic structures.

Conclusion: Che-Ting Chan's contributions to the field of photonics through his innovative patents illustrate the potential of advanced materials in creating practical applications. His work remains significant in the ongoing evolution of technology, paving the way for future developments in the photonic industry. The combination of his expertise and collaborative efforts with peers marks a promising avenue for further innovation in this dynamic field.

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