This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Hermes-Epitek Corporation. Active years: 2016-2017.
Company Filing History:
Years Active: 2016-2017
Title: Innovations of Che-Lin Chen in Semiconductor Manufacturing
Introduction
Che-Lin Chen is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, holding 2 patents that showcase his innovative approach to technology.
Latest Patents
One of his latest patents is a method and system for manufacturing semiconductor epitaxy structures. This system includes a deposition apparatus, a curvature monitor system, and a control unit. The deposition apparatus is designed to sequentially deposit a buffer layer, a first epitaxy layer, an insertion layer, and a second epitaxy layer on a substrate. The curvature monitor system is responsible for monitoring the curvature value of the semiconductor epitaxy structure. The control unit manages the deposition process, ensuring that the apparatus stops depositing layers based on the curvature value measured by the monitor system. This innovative system effectively controls the strain of the semiconductor epitaxy structure during growth, enhancing the manufacturing process.
Career Highlights
Che-Lin Chen is currently employed at Hermes-Epitek Corporation, where he continues to develop cutting-edge technologies in semiconductor manufacturing. His work has been instrumental in advancing the efficiency and effectiveness of semiconductor production.
Collaborations
He has collaborated with notable coworkers such as Takashi Kobayashi and Po-Jung Lin, contributing to a dynamic and innovative work environment.
Conclusion
Che-Lin Chen's contributions to semiconductor manufacturing through his patents and work at Hermes-Epitek Corporation highlight his role as a key innovator in the field. His advancements are paving the way for future developments in semiconductor technology.