Che-Liang Li

Title: Che-Liang Li: Innovator in Substrate Measurement Technologies

Introduction

Che-Liang Li is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of substrate measurement technologies, holding a total of 3 patents. His work focuses on advancing methods for analyzing line edge roughness, which is crucial in semiconductor manufacturing.

Latest Patents

One of Che-Liang Li's latest patents involves line edge roughness analysis using atomic force microscopy. This innovative method includes scanning a substrate with a scanning probe microscope to obtain images of fin top regions. The process involves analyzing the line edge profile of the fins using power spectral density (PSD) methods to derive spatial frequency data. Ultimately, this technology allows for the calculation of line edge roughness based on the obtained spatial frequency data.

Career Highlights

Che-Liang Li is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise in substrate measurement has positioned him as a valuable asset in the development of advanced manufacturing techniques.

Collaborations

Throughout his career, Che-Liang Li has collaborated with notable colleagues, including Wei-Shan Hu and Dong Gui. These partnerships have fostered innovation and contributed to the success of various projects within the semiconductor field.

Conclusion

Che-Liang Li's work in substrate measurement technologies exemplifies the importance of innovation in the semiconductor industry. His patents and collaborations continue to influence advancements in this critical area of technology.