Taoyuan, Taiwan

Che-Hsien Lin

This inventor holds 9 USPTO granted patents. Top assignees: Lianhong Art Co., Ltd., United Microelectronics Corp.. Active years: 2012-2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Che-Hsien Lin. Retrieved from https://idiyas.com/inventor/che-hsien-lin-l32cedpl

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 77.8

Average Co-Inventor Count = 3.1

ph-index = 5

Forward Citations = 124(Granted Patents)


Company Filing History:


Years Active: 2012-2021

Loading Chart...
9 patents (USPTO):Explore Patents

Title: Innovations of Che-Hsien Lin: Pioneering Semiconductor Technologies

Introduction

Che-Hsien Lin is a notable inventor based in Taoyuan, Taiwan, recognized for his contributions to the field of semiconductor technology. With a remarkable portfolio of 9 patents, Lin has established himself as a leading figure in the development of innovative manufacturing techniques for semiconductor devices. His work has significant implications for the efficiency and performance of electronic components.

Latest Patents

Among Che-Hsien Lin's latest innovations are two pivotal patents that highlight his expertise in semiconductor manufacturing processes.

The first patent, titled "Manufacturing method of semiconductor device including conductive structure," outlines a detailed process for creating semiconductor devices. This invention involves several steps, including the formation of a semiconductor substrate, a source/drain region, and a dielectric layer, followed by the construction of a conductive structure to enhance the electrical performance of the device.

The second patent, "Fin field effect transistor having crystalline titanium germanosilicide stressor layer," describes a semiconductor structure incorporating silicon germanium (SiGe) regions and a multi-layer contact structure comprising a titanium nitride barrier layer. This patent emphasizes the integration of a crystalline titanium germanosilicide stressor layer, which contributes to device efficiency and performance within the semiconductor substrate.

Career Highlights

Che-Hsien Lin has had an impactful career, working with esteemed companies such as Lianhong Art Co., Ltd. and United Microelectronics Corporation. His roles within these organizations have allowed him to develop and refine his innovative concepts, making significant advancements in semiconductor technologies.

Collaborations

Throughout his career, Che-Hsien Lin has collaborated with talented individuals, including his noteworthy coworkers Chia Hui Chen and Te-Chang Hsu. These partnerships have bolstered his research endeavors, leading to the successful development of several patented technologies that contribute to advancements in the semiconductor industry.

Conclusion

Che-Hsien Lin exemplifies the innovative spirit of modern inventors, particularly within the semiconductor sector. With his impressive portfolio of patents and collaborations, he continues to shape the future of technology through groundbreaking inventions. His work not only enhances electronic device performance but also inspires the next generation of innovators in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…