Chaucer Chung

Title: Chaucer Chung: Innovator in Semiconductor Technology

Introduction

Chaucer Chung is a prominent inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approaches to improving manufacturing processes.

Latest Patents

Chung's latest patents include a method of forming a shallow trench isolation using a SiON anti-reflective coating, which eliminates water spot defects. This method begins by providing a substrate, followed by the formation of a pad oxide layer over the substrate. A silicon nitride layer is then formed on the pad oxide layer, and a silicon oxynitride layer is formed on the silicon nitride layer. A photoresist mask with an opening is created over the silicon oxynitride layer, allowing for the etching of the layers to form a trench. The photoresist mask is subsequently removed, and the silicon oxynitride layer is key to the process, as it is removed to allow for the growth of a thin silicon oxide layer, which is then deposited and planarized to create a shallow trench isolation.

Another notable patent involves the use of a novel capped anneal procedure to improve salicide formation. This process is designed for forming a low resistance titanium disilicide layer on regions of a MOSFET device. It features the deposition of a capping silicon oxide layer on high resistance titanium disilicide regions. This capping layer, which has compressive stress, reduces the risk of adhesion loss or peeling from the underlying regions of the MOSFET device. Additionally, it protects the titanium disilicide regions during the anneal cycle, which is crucial for converting high resistance regions to low resistance.

Career Highlights

Chaucer Chung is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work focuses on enhancing the efficiency and reliability of semiconductor manufacturing processes.

Collaborations

Chung has collaborated with notable colleagues such as Jiunn-Der Yang and Yuan-Chang Huang, contributing to advancements in semiconductor technology through teamwork and shared expertise.

Conclusion

Chaucer Chung's innovative patents and contributions to the semiconductor industry highlight his role as a key inventor in this field. His work continues to influence the development of advanced manufacturing techniques, ensuring the progress of technology in the semiconductor sector.