San Jose, CA, United States of America

Charu Kothari

This inventor holds 1 USPTO granted patent. Top assignee: Amazon Technologies, Inc.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Charu Kothari. Retrieved from https://idiyas.com/inventor/charu-kothari

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2025

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Charu Kothari: Innovator in Outfit Simulation Technology

Introduction

Charu Kothari is an accomplished inventor based in San Jose, California. He has made significant contributions to the field of outfit simulation technology, showcasing his innovative spirit and technical expertise.

Latest Patents

Charu Kothari holds a patent for a "Method and system for outfit simulation using layer mask." This patent describes a method that generates a virtual model of a human body based on a selected image. It also involves creating a segment of clothing based on a chosen image of the article. The method includes generating a layer mask that determines how output pixels of an image should be produced, ultimately displaying the clothing on the virtual model.

Career Highlights

Charu Kothari is currently employed at Amazon Technologies, Inc., where he continues to develop and refine his innovative ideas. His work focuses on enhancing user experiences through advanced simulation technologies.

Collaborations

Some of his notable coworkers include Benjamin James Biggs and Philip Pinette, who contribute to the collaborative environment at Amazon Technologies, Inc.

Conclusion

Charu Kothari's work in outfit simulation technology exemplifies the intersection of creativity and technology. His innovative patent reflects his commitment to advancing the field and improving how clothing is visualized on virtual models.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…