Charles Van Nutt

Title: The Innovations of Charles Van Nutt

Introduction

Charles Van Nutt is a notable inventor based in Monroe, NY (US). He has made significant contributions to the field of sputtering technology, holding a total of 4 patents. His work has advanced the methods used in the manufacturing of sputtering targets, which are essential in various coating processes.

Latest Patents

One of his latest patents is a method of pretexturing a cathode sputtering target and sputter coating. This innovation involves artificially roughening the sputtering surface of the target to create a texture that mimics the effects of a lengthy sputter burn-in process. The preferred texture size ranges from 0.05 to 3.0 millimeters, achieved through techniques such as machining grooves or chemical etching. Another significant patent is the method of enhancing the performance of a magnetron sputtering target. This invention generates a plasma confining magnetic field that flattens over the target's life, thereby increasing the number of wafers coated during its lifespan.

Career Highlights

Throughout his career, Charles Van Nutt has worked with prominent companies such as Materials Research Corporation and Sony Corporation. His expertise in sputtering technology has made him a valuable asset in these organizations.

Collaborations

He has collaborated with notable individuals in the field, including Steven D Hurwitt and Israel Wagner. Their combined efforts have contributed to advancements in sputtering technology.

Conclusion

Charles Van Nutt's innovations in sputtering technology have significantly impacted the industry. His patents reflect a deep understanding of the processes involved and demonstrate his commitment to enhancing performance in manufacturing.