Tempe, AZ, United States of America

Charles T Keller

This inventor holds 1 USPTO granted patent. Top assignee: Motorola Corporation. Active years: 1991.


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 1991

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Charles T. Keller

Introduction

Charles T. Keller is a notable inventor based in Tempe, AZ (US). He has made significant contributions to the field of plasma technology, particularly in the production of a plasma containing beryllium and beryllium fluoride. His work has implications for various applications, including semiconductor manufacturing.

Latest Patents

Keller holds a patent for a method of producing a plasma that contains both beryllium ions and beryllium fluoride ions. This innovative process involves using beryllium crystals as a cathode in an ionization chamber filled with boron trifluoride gas. The ionization of both the boron trifluoride gas and beryllium results in the generation of beryllium fluoride ions (BeF.sup.+) and beryllium ions (Be.sup.+). The emitted beryllium fluoride ions are directed to impact a semiconductor target, where they divide, effectively implanting beryllium and fluorine into the material.

Career Highlights

Keller is associated with Motorola Corporation, where he has been able to apply his expertise in plasma technology. His work at Motorola has allowed him to contribute to advancements in semiconductor technology, which is crucial for modern electronics.

Collaborations

One of Keller's notable collaborators is Schyi-Yi Wu. Their partnership has likely fostered innovative ideas and solutions in their respective fields.

Conclusion

Charles T. Keller's contributions to plasma technology and his innovative patent demonstrate his significant role in advancing semiconductor manufacturing. His work continues to influence the industry and showcases the importance of innovation in technology.

Profile summary based on public USPTO records.
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