Company Filing History:
Years Active: 2007
Title: Innovations by Charles Sischile
Introduction
Charles Sischile is an accomplished inventor based in Alameda, California. He has made significant contributions to the field of technology, particularly in the area of chemical mechanical polishing (CMP) pads. His innovative approach has led to the development of a unique patent that enhances the lamination process of CMP pads.
Latest Patents
One of Charles Sischile's notable patents is titled "Layered support and method for laminating CMP pads." This invention provides a device and method for laminating CMP pads by supporting them with a board that has material compositions similar to the CMP pad. This support minimizes the risk of damage during lamination and improves adhesion. The design includes a first board that may have a recess to accept the CMP pad, ensuring that the pad's dimensions are equal to or greater than the pad material. An alternative embodiment features a board on the opposite side of the CMP pad for enhanced lamination.
Career Highlights
Charles Sischile is currently associated with Mipox International Corporation, where he continues to innovate and contribute to advancements in CMP technology. His work has been instrumental in improving the efficiency and effectiveness of CMP pad lamination processes.
Collaborations
Throughout his career, Charles has collaborated with talented individuals such as Ichiro Kodaka and Alvin Timbang. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.
Conclusion
Charles Sischile's contributions to the field of CMP technology through his innovative patent demonstrate his commitment to advancing industry standards. His work not only enhances the lamination process but also sets a precedent for future innovations in the field.