Austin, TX, United States of America

Charles Schlechte

USPTO Granted Patents = 3 

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2022-2025

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3 patents (USPTO):Explore Patents

Title: Charles Schlechte: Innovator in Plasma Processing Technology

Introduction

Charles Schlechte is a notable inventor based in Austin, TX, who has made significant contributions to the field of plasma processing technology. With a total of 3 patents to his name, he has demonstrated a commitment to advancing the capabilities of plasma systems.

Latest Patents

One of his latest patents focuses on "Plasma processing with broadband RF waveforms." This innovative plasma system includes a plasma apparatus that comprises a plasma chamber and a substrate support. The system features an electromagnetic (EM) circuit block coupled to a radio frequency (RF) electrode. The EM circuit block is equipped with a broadband RF waveform function generator, which distributes EM power over a range of frequencies. Additionally, it includes a broadband impedance matching network that ensures optimal performance across the operating frequency range. A controller is programmed to adjust input parameters of the EM circuit block, enhancing the system's efficiency and effectiveness.

Career Highlights

Charles Schlechte is currently employed at Tokyo Electron Limited, where he continues to develop cutting-edge technologies in plasma processing. His work has been instrumental in improving the performance and reliability of plasma systems used in various applications.

Collaborations

Throughout his career, Charles has collaborated with esteemed colleagues, including Jianping Zhao and John L. Carroll. These partnerships have fostered innovation and contributed to the advancement of plasma processing technologies.

Conclusion

Charles Schlechte's contributions to plasma processing technology highlight his role as a leading inventor in the field. His innovative patents and collaborations reflect his dedication to advancing technology and improving industry standards.

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