Company Filing History:
Years Active: 1990
Title: The Innovative Contributions of Charles S. Rhoades
Introduction
Charles S. Rhoades is a notable inventor based in Huntington Beach, CA. He has made significant contributions to the field of semiconductor devices, holding a total of 2 patents. His work focuses on advanced methods for fabricating metal interconnection layers, which are crucial for the performance and reliability of integrated circuits.
Latest Patents
Rhoades' latest patents include a "Fully recessed interconnection scheme with titanium-tungsten" and "A method of fabricating higher-order metal interconnection layers in a multi-level metal semiconductor device." The first patent describes a semiconductor device that incorporates a metal layer, an oxide layer, and a metal plug. The process involves forming a reverse photoresist mask, etching trenches, and depositing an adhesion layer, followed by a low viscosity photoresist layer. This innovative method enhances the fabrication of higher-order metal interconnection layers. The second patent outlines methods for fabricating metal interconnection lines in integrated circuits, emphasizing the selective deposition of tungsten to improve yield and reliability.
Career Highlights
Throughout his career, Rhoades has worked with prominent companies, including Hughes Aircraft Company. His expertise in semiconductor technology has positioned him as a valuable contributor to advancements in the field. His innovative approaches have led to improved manufacturing processes and enhanced performance of integrated circuits.
Collaborations
Rhoades has collaborated with notable colleagues such as Kuan Y. Liao and Yu C. Chow. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Charles S. Rhoades is a distinguished inventor whose work has significantly impacted the semiconductor industry. His patents reflect a commitment to advancing technology and improving the efficiency of integrated circuits. His contributions continue to influence the field and inspire future innovations.
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