Dayton, OH, United States of America

Charles O Maney

This inventor holds 1 USPTO granted patent. Top assignee: Ncr Corporation. Active years: 2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Charles O Maney. Retrieved from https://idiyas.com/inventor/charles-o-maney

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: The Innovative Mind of Charles O Maney

Introduction

Charles O Maney is a notable inventor based in Dayton, OH (US). He has made significant contributions to the field of innovation, particularly with his unique patent that addresses safety concerns related to heat and UV radiation exposure.

Latest Patents

One of Charles O Maney's most recent patents is the "UV and thermal guard." This invention features an image element that contains an imperceptible message. This message becomes visible when the image element is subjected to excessive heat and/or UV radiation. The design is intended to warn users that the associated material has been compromised due to these environmental factors.

Career Highlights

Charles O Maney is currently employed at NCR Corporation, where he continues to develop innovative solutions. His work at NCR Corporation showcases his commitment to advancing technology and safety in various applications.

Collaborations

Throughout his career, Charles has collaborated with talented individuals such as Joseph D Roth and Wendell B Halbrook, Jr. These partnerships have likely contributed to the success of his inventions and the advancement of technology in his field.

Conclusion

Charles O Maney exemplifies the spirit of innovation through his patent and work at NCR Corporation. His contributions to safety technology highlight the importance of addressing environmental challenges in modern materials.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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