Southfield, MI, United States of America

Charles F Zimmerman

This inventor holds 1 USPTO granted patent. Top assignee: Gte Valenite Corporation. Active years: 1988.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Charles F Zimmerman. Retrieved from https://idiyas.com/inventor/charles-f-zimmerman

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 27(Granted Patents)


Company Filing History:


Years Active: 1988

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1 patent (USPTO):Explore Patents

Title: The Innovations of Charles F. Zimmerman

Introduction

Charles F. Zimmerman is an accomplished inventor based in Southfield, MI. He is known for his innovative contributions to the field of cutting tools. With a focus on enhancing efficiency and performance, Zimmerman has made significant strides in the industry.

Latest Patents

Zimmerman holds a patent for a polygonal cutting insert. This cutting insert features a chip breaker with a backwall arranged in a sinuous path. The design effectively deflects chips toward the center of the insert, improving the cutting process.

Career Highlights

Zimmerman has dedicated his career to advancing cutting technology. He works at GTE Valenite Corporation, where he continues to develop innovative solutions for the manufacturing sector. His work has been instrumental in enhancing the performance of cutting tools.

Collaborations

Zimmerman has collaborated with notable colleagues, including Thomas J. Bernadic and Tony M. Lowe. These partnerships have fostered a creative environment that encourages innovation and the development of new technologies.

Conclusion

Charles F. Zimmerman exemplifies the spirit of innovation in the cutting tool industry. His contributions, particularly his patented polygonal cutting insert, demonstrate his commitment to improving manufacturing processes. His work continues to influence the field and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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