Chaoxia Wang

Title: Innovations by Chaoxia Wang: Pioneering UV-Resistant Materials

Introduction

Chaoxia Wang is a notable inventor based in Wuxi, China. He has made significant contributions to the field of materials science, particularly in the development of innovative polyurethane elastomers and UV-curable inks. With a total of 2 patents to his name, Wang's work showcases his commitment to advancing technology in practical applications.

Latest Patents

Wang's latest patents include a preparation method for an ultraviolet (UV)-resistant and transparent lignin-based polyurethane (PU) elastomer. This innovative method utilizes natural lignin-based polyols as an end-capping agent, combined with isophorone diisocyanate and 2,2-dimethylolbutyric acid to create a PU elastomer that boasts excellent mechanical properties, high elasticity, and UV resistance. The preparation process is straightforward, making it suitable for various applications, including PU elastomer films and biomass polymer materials.

Another significant patent by Wang is the method of preparing UV-curable inkjet pigment ink for textile printing. This method employs mini-emulsion techniques to encapsulate essential components, resulting in a UV-curable pigment paste that, when mixed with co-solvents and surfactants, produces a high-quality ink. The resulting ink demonstrates excellent fluency during printing, vibrant colors, and strong color fastness in the final products.

Career Highlights

Chaoxia Wang is affiliated with Jiangnan University, where he continues to engage in research and development. His work not only contributes to academic knowledge but also has practical implications in various industries, particularly in textiles and materials engineering.

Collaborations

Wang collaborates with esteemed colleagues such as Shaohai Fu and Yu Guan, enhancing the scope and impact of his research endeavors.

Conclusion

Chaoxia Wang's innovative work in developing UV-resistant materials and high-quality inks exemplifies the potential of modern materials science. His contributions are paving the way for advancements in various applications, showcasing the importance of innovation in today's technological landscape.