San Diego, CA, United States of America

Chaowei Wang

USPTO Granted Patents = 8 

Average Co-Inventor Count = 3.5

ph-index = 2

Forward Citations = 5(Granted Patents)


Location History:

  • San Diego, CA (US) (2023)
  • San Jose, CA (US) (2023)

Company Filing History:


Years Active: 2023-2025

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8 patents (USPTO):

Title: The Innovative Contributions of Chaowei Wang

Introduction

Chaowei Wang is a prominent inventor based in San Diego, California. He has made significant contributions to the field of plasma technology, holding a total of six patents. His work focuses on enhancing the performance and efficiency of plasma showerheads, which are essential in various industrial applications.

Latest Patents

Wang's latest patents include innovative designs for gas distribution plates and plasma showerheads. These patents feature improved uniformity in gas distribution, which is crucial for achieving optimal performance in plasma applications. Notably, his inventions include a plasma showerhead with angled gas nozzles, as well as gas nozzles that have a vertical offset angle and/or a directional offset angle. Importantly, none of the gas channels or nozzles intersect with the plasma regions of the showerhead, ensuring enhanced functionality.

Career Highlights

Throughout his career, Chaowei Wang has worked with notable companies such as Applied Materials, Inc. and Utica Leaseco, LLC. His experience in these organizations has allowed him to develop and refine his innovative ideas, contributing to advancements in plasma technology.

Collaborations

Wang has collaborated with talented individuals in his field, including Kartik Bhupendra Shah and Sanjeev Baluja. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Chaowei Wang's contributions to plasma technology through his patents and collaborations highlight his role as an influential inventor. His work continues to impact the industry, paving the way for future innovations in plasma applications.

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