Chaomei Liu

Title: Chaomei Liu: Innovator in Plasma Processing Technology

Introduction

Chaomei Liu is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of plasma processing, particularly in the etching of silicon films. His innovative approach has the potential to enhance the efficiency and quality of semiconductor manufacturing.

Latest Patents

Chaomei Liu holds a patent for a plasma processing method. This method focuses on plasma etching a silicon film or polysilicon film that contains boron. The process utilizes a mixed gas comprising a halogen gas, a fluorine-containing gas, and boron trichloride gas. This innovative technique improves the etching rate while reducing defects during the plasma etching of boron-containing films.

Career Highlights

Chaomei Liu is associated with Hitachi High-Tech Corporation, where he applies his expertise in plasma processing technology. His work has been instrumental in advancing the capabilities of semiconductor manufacturing processes. Liu's contributions are recognized within the industry for their impact on improving production efficiency.

Collaborations

Some of Chaomei Liu's notable coworkers include Hitoshi Kobayashi and Masahito Mori. Their collaborative efforts contribute to the ongoing advancements in plasma processing technologies.

Conclusion

Chaomei Liu's innovative work in plasma processing methods showcases his commitment to enhancing semiconductor manufacturing. His contributions are vital for the future of technology in this field.