Guangzhou, China

Chaolong Fan

This inventor holds 1 USPTO granted patent. Top assignee: Guangdong University of Technology. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chaolong Fan. Retrieved from https://idiyas.com/inventor/chaolong-fan-vtdxywt3

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 7.0

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Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Innovations of Chaolong Fan in Grating Ruler Technology

Introduction

Chaolong Fan is a notable inventor based in Guangzhou, China. He has made significant contributions to the field of measurement technology, particularly through his innovative patent related to grating rulers. His work is instrumental in enhancing the accuracy and efficiency of measurement systems.

Latest Patents

Chaolong Fan holds a patent titled "Method of assisted mounting and error compensation for absolute grating ruler." This patent describes a method that involves the precise mounting of a CMOS sensor and a grating ruler body. The method addresses the challenges posed by angular discrepancies between the sensor and the ruler, ensuring that the code reading difference is minimized. This innovation is crucial for achieving accurate measurements in various applications.

Career Highlights

Chaolong Fan is affiliated with the Guangdong University of Technology, where he continues to advance research in measurement technologies. His expertise in the field has led to the development of practical solutions that improve the functionality of measurement devices.

Collaborations

Chaolong Fan has collaborated with esteemed colleagues such as Han Wang and Zhixiong Wu. Their combined efforts contribute to the ongoing research and development in measurement technology.

Conclusion

Chaolong Fan's innovative work in the field of grating ruler technology exemplifies the importance of precision in measurement systems. His contributions are paving the way for advancements that enhance accuracy and efficiency in various applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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