Chao Yuan Chang

Title: Chao Yuan Chang: Innovator in Electroplating Technology

Introduction

Chao Yuan Chang is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of electroplating technology, holding a total of 3 patents. His work focuses on improving the efficiency and effectiveness of plating apparatuses used in semiconductor manufacturing.

Latest Patents

One of Chao Yuan Chang's latest patents is a plating apparatus and method for electroplating wafers. This innovative apparatus includes a housing that defines a plating chamber for housing a plating solution. The voltage source of the apparatus features a first terminal with a first polarity and a second terminal with a different polarity. The first terminal is electrically coupled to the wafer, while an anode is positioned within the plating chamber, with the second terminal connected to it. Additionally, a membrane support is located within the plating chamber and over the anode, which defines apertures. In this design, the membrane support has varying aperture-area to surface-area ratios in different zones, enhancing the electroplating process.

Career Highlights

Chao Yuan Chang has worked with prominent companies in the semiconductor industry, including Taiwan Semiconductor Manufacturing Company Limited. His experience in these organizations has allowed him to refine his skills and contribute to advancements in electroplating technology.

Collaborations

Chao Yuan Chang has collaborated with notable colleagues such as Che-Min Lin and Hung-San Lu. These partnerships have fostered innovation and development in their respective fields.

Conclusion

Chao Yuan Chang is a distinguished inventor whose work in electroplating technology has made a significant impact on the semiconductor industry. His patents reflect his commitment to innovation and excellence in engineering.