Location History:
- Hsinchu, TW (1998 - 2002)
- Chung-Li, TW (1999 - 2003)
Company Filing History:
Years Active: 1998-2003
Title: Innovations by Chao-Yi Lan: Advancements in Semiconductor Technology
Introduction
Chao-Yi Lan, a prominent inventor based in Chung-Li, Taiwan, has made significant contributions to the field of semiconductor technology. With an impressive portfolio of five patents, Lan's innovative methods and solutions have impacted the design and functionality of color image sensors and polysilicon layers.
Latest Patents
One of Chao-Yi Lan's most notable patents revolves around a polysilicon layer having improved roughness after POCl3 doping. This invention describes an enhanced method for depositing polysilicon layers, where the deposition process occurs in two stages. Initially, a conventional temperature of approximately 630°C is maintained. Subsequently, as the desired thickness is achieved, the temperature is ramped down to around 560°C, allowing the film growth to continue uninterrupted. This innovative technique results in polysilicon films with exceptionally smooth surfaces, contributing to superior breakdown voltages in dielectric layers formed by oxidation.
Another significant patent focuses on protecting a bond pad structure in a color image sensor cell during the fabrication of color filters. This inventive process incorporates a passivation layer comprised of an overlying silicon nitride layer and an underlying silicon oxide layer, shielding the bond pad from exposure to alkaline developer solutions. The results of this invention enhance the mechanical properties and bondability of the bond pad structure, ultimately leading to improved performance of the color image sensor cell.
Career Highlights
Chao-Yi Lan is affiliated with Taiwan Semiconductor Manufacturing Company Limited, a key player in the semiconductor industry. His work in this esteemed organization has allowed him to apply his innovative solutions to real-world challenges, enhancing the efficacy of various semiconductor applications.
Collaborations
In his endeavors, Chao-Yi Lan has collaborated with talented colleagues such as Shean-Ren Horng and Chun-Chieh Chang. Together, they have contributed to advancements that shape the future of semiconductor technology, showcasing their collective commitment to innovation.
Conclusion
Chao-Yi Lan's significant contributions to the field of semiconductor technology are marked by his inventive patents and collaborative spirit. His work not only improves the performance of electronic devices but also exemplifies the spirit of innovation in the technology sector. With continued efforts and remarkable achievements, Lan undoubtedly stands out as a pioneering figure in the realm of modern inventions.