Hsinchu, Taiwan

Chao-Shang Chen

This inventor holds 1 USPTO granted patent. Top assignee: Zen Voce Corporation. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chao-Shang Chen. Retrieved from https://idiyas.com/inventor/chao-shang-chen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: Innovations by Chao-Shang Chen

Introduction

Chao-Shang Chen is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of integrated circuits through his innovative methods. His work focuses on enhancing the efficiency and yield rates in the manufacturing processes of electronic components.

Latest Patents

Chao-Shang Chen holds a patent titled "Method for enhancing the yield rate of ball implanting of a substrate of an integrated circuit." This patent describes a method for implanting solder balls in an integrated circuit using a specialized ball implanting machine. The machine includes a suction fixture, an evacuating device, two pivoting and inverting devices, a guide plate, a ball carrier, and a substrate. The design ensures that solder balls are properly aligned and do not interfere with each other during the implantation process, thereby improving the overall yield rate.

Career Highlights

Chao-Shang Chen is currently associated with Zen Voce Corporation, where he continues to innovate in the field of integrated circuits. His expertise and dedication to improving manufacturing processes have made him a valuable asset to his company.

Collaborations

Chao-Shang Chen collaborates with Yu-Kai Lin, working together to advance their projects and share insights in their field of expertise.

Conclusion

Chao-Shang Chen's contributions to the field of integrated circuits through his innovative patent demonstrate his commitment to enhancing technology. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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