Company Filing History:
Years Active: 2016-2017
Title: Chao-Chun Ning: Innovator in Semiconductor Technology
Introduction
Chao-Chun Ning is a prominent inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of lateral-diffused metal oxide semiconductor devices. With a total of 2 patents to his name, Ning continues to push the boundaries of innovation in this critical area of electronics.
Latest Patents
Ning's latest patents focus on the fabrication methods of lateral-diffused metal oxide semiconductor devices. These devices include a substrate, a second deep well, a gate, a source, a drain, and a first dopant region. The substrate features a first deep well with a first conductive type, while the second deep well, having a second conductive type, is positioned within the first deep well. The gate is strategically placed on the substrate, marking the boundary between the first and second deep wells. The source and drain, which possess a second conductive type, are located adjacent to the gate within both deep wells. Additionally, the first dopant region, characterized by a first conductive type, is situated in the second deep well, ensuring it is separated from the drain. Furthermore, a method for fabricating this lateral-diffused metal oxide semiconductor device is also included in his patents.
Career Highlights
Chao-Chun Ning is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His work at this organization has allowed him to collaborate with other talented professionals and contribute to groundbreaking advancements in semiconductor technology.
Collaborations
Ning has worked alongside notable colleagues such as Ming-Shing Chen and Wei-Ting Wu. Their combined expertise has fostered an environment of innovation and creativity, leading to the successful development of new technologies in the semiconductor field.
Conclusion
Chao-Chun Ning is a dedicated inventor whose work in semiconductor technology has made a lasting impact. His innovative patents and collaborations with esteemed colleagues highlight his commitment to advancing the field. As he continues to develop new technologies, Ning's contributions will undoubtedly shape the future of electronics.