Chanyang Lee

Title: Innovations by Chanyang Lee

Introduction

Chanyang Lee is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of wiring structures, holding two patents that showcase his innovative designs and technical expertise.

Latest Patents

Chanyang Lee's latest patents include "Wiring structures having intersecting metal patterns" and "Wiring structures having a metal pattern intersection portion." The first patent describes a wiring structure that consists of first to third metal patterns on a substrate. The first metal pattern extends in a second direction and has a first width in a third direction. The second metal pattern crosses the first and has a second width in the second direction. The third metal pattern connects to both the first and second patterns at their intersection, featuring a rectangular shape with concave portions in each quadrant. The third width is defined as the minimum distance between opposite concave portions in a fourth direction, which is less than or equal to the smaller of the first and second widths. The second patent shares similar characteristics, emphasizing the innovative design of wiring structures.

Career Highlights

Chanyang Lee is currently employed at Samsung Electronics Co., Ltd., where he continues to develop cutting-edge technologies. His work has contributed to advancements in electronic components, particularly in wiring structures that enhance performance and efficiency.

Collaborations

Chanyang Lee collaborates with talented coworkers, including Jeonggil Lee and Sukhoon Kim. Their combined expertise fosters a creative environment that drives innovation within their projects.

Conclusion

Chanyang Lee's contributions to wiring structures reflect his dedication to innovation and excellence in technology. His patents demonstrate a commitment to advancing the field, making him a valuable asset to Samsung Electronics Co., Ltd.