Company Filing History:
Years Active: 2014
Title: Biography of Inventor Changquing Hu
Introduction: Changquing Hu is an accomplished inventor based in Sunnyvale, California. He has made significant contributions to the field of photolithography, particularly in the development of innovative techniques for determining source patterns.
Latest Patents: Changquing Hu holds a patent titled "Determining source patterns for use in photolithography." This patent describes embodiments of a computer system, a process, a computer-program product, and a data structure for use with the computer system. These embodiments are designed to determine or generate source patterns that define illumination patterns on photo-masks during a photolithographic process. The patent also discusses the concurrent and sequential determination of source patterns and associated mask patterns, utilizing level-set functions and Inverse Lithography (ILT) calculations.
Career Highlights: Changquing Hu is currently employed at Synopsys, Inc., a leading company in electronic design automation. His work focuses on enhancing photolithographic processes, which are crucial in semiconductor manufacturing.
Collaborations: Throughout his career, Changquing Hu has collaborated with various professionals in the field, including his coworker Linyong Pang. These collaborations have contributed to advancements in photolithography and related technologies.
Conclusion: Changquing Hu's innovative work in photolithography and his patent contributions highlight his expertise and commitment to advancing technology in the semiconductor industry.