Suwon-si, South Korea

Changmook Rim

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Changmook Rim. Retrieved from https://idiyas.com/inventor/changmook-rim-aef0bfkf

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Changmook Rim: Innovator in Protective Film Technology

Introduction

Changmook Rim is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of electronic devices through his innovative patent. His work focuses on enhancing the durability and functionality of display devices.

Latest Patents

Changmook Rim holds a patent for a "Protective film structure and electronic device comprising same." This invention features a protective film that includes a hard coating layer, a transparent adhesive layer, a base layer situated between the hard coating layer and the transparent adhesive layer, and a primer layer located between the transparent adhesive layer and the base layer. Notably, the transparent adhesive layer comprises at least one of polysilazane or silazane, which contributes to the film's effectiveness.

Career Highlights

Changmook Rim is currently employed at Samsung Electronics Ltd., a leading company in the technology sector. His role at Samsung allows him to work on cutting-edge innovations that impact the electronics industry.

Collaborations

He collaborates with talented coworkers, including Suyoung Seo and Hyeonbeom Kim, who contribute to the development of advanced technologies in their projects.

Conclusion

Changmook Rim's contributions to protective film technology exemplify the innovative spirit of modern inventors. His patent reflects a commitment to improving electronic devices, showcasing the importance of research and development in the tech industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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