This inventor holds 2 USPTO granted patents. Top assignee: Texas Instruments Corporation. Active years: 2005-2008.
Location History:
- Plano, TX (US) (2005)
- Dallas, TX (US) (2008)
Company Filing History:
Years Active: 2005-2008
Title: Changan Wang: Innovator in Lithography and Exposure Tool Characterization
Introduction
Changan Wang is a notable inventor based in Dallas, TX, who has made significant contributions to the field of lithography and exposure tool characterization. With a total of 2 patents, his work focuses on enhancing the quality and efficiency of circuit feature imaging.
Latest Patents
Wang's latest patents include a method for optimizing multiple feature lithography. This invention involves generating a series of maps associated with various circuit features, which helps in determining the quality of features based on different point sources. The method aims to identify point sources that can achieve a predetermined quality threshold when imaging circuit features onto a target surface. Another significant patent involves characterizing an exposure tool for patterning a wafer. This process includes analyzing data from patterns formed on a wafer to reduce errors and improve the characterization of the exposure tool.
Career Highlights
Changan Wang is currently employed at Texas Instruments Corporation, where he applies his expertise in lithography and exposure tools. His innovative approaches have contributed to advancements in the semiconductor industry, particularly in improving the precision of circuit designs.
Collaborations
Wang has collaborated with notable colleagues, including Gary Guohong Zhang and Guohong Zhang, to further enhance the research and development efforts in their field.
Conclusion
Changan Wang's contributions to lithography and exposure tool characterization demonstrate his commitment to innovation in technology. His patents reflect a deep understanding of the complexities involved in circuit feature imaging, making him a valuable asset in the industry.