Chang Wook Doh

Title: Chang Wook Doh: Innovator in Device Fabrication

Introduction

Chang Wook Doh is a notable inventor based in Santa Clara, CA. He has made significant contributions to the field of device fabrication, particularly through his innovative approaches to processing substrates. With a total of 2 patents, his work has garnered attention in the industry.

Latest Patents

Chang Wook Doh's latest patents focus on device fabrication via pulsed plasma. The systems and methods discussed in these patents are directed towards processing substrates, including the formation of a plurality of features in a target layer on a substrate. The formation process includes a main etch operation that creates features to a first depth in the target layer. This main etch operation is followed by a phase shift sync pulsing (PSSP) operation, and these two operations are repeated iteratively to achieve the desired depth. The PSSP operation involves cycles of RF source power and RF bias power, which deposit a protective coating in and on the features, followed by etching a portion of the protective coating to expose parts of the feature.

Career Highlights

Chang Wook Doh is currently employed at Applied Materials, Inc., where he continues to advance his research and development efforts in device fabrication. His work has been instrumental in enhancing the efficiency and effectiveness of substrate processing techniques.

Collaborations

Some of his notable coworkers include Zhibin Wang and Byungkook Kong, who collaborate with him on various projects within the company.

Conclusion

Chang Wook Doh is a prominent figure in the field of device fabrication, with a focus on innovative methods that enhance substrate processing. His contributions through patents and collaboration with industry professionals underscore his impact on the technology landscape.