Suwon, South Korea

Chang-won Ryu

This inventor holds 2 USPTO granted patents. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2018-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chang-won Ryu. Retrieved from https://idiyas.com/inventor/chang-won-ryu-agc6gcrx

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0

Average Co-Inventor Count = 6.0

ph-index = 2

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2018-2019

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2 patents (USPTO):Explore Patents

Title: Chang-won Ryu: Innovator in LED Display Technology

Introduction

Chang-won Ryu is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of LED display technology, holding 2 patents that showcase his innovative approach to coating methods.

Latest Patents

His latest patents include a fine interval coating member for LED displays and a coating method using the same. This innovative coating member features column portions and row portions that intersect, creating holes between them. The body portion is made from a material that melts at a temperature higher than room temperature and cures at room temperature, enhancing the performance and efficiency of LED displays.

Career Highlights

Chang-won Ryu is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of technology. His work has been instrumental in advancing the capabilities of LED displays, making them more effective and reliable.

Collaborations

He collaborates with talented coworkers, including Jae-sang Kim and Jee-su Park, contributing to a dynamic and innovative work environment.

Conclusion

Chang-won Ryu's contributions to LED display technology through his patents and work at Samsung Electronics Co., Ltd. highlight his role as a key innovator in the field. His advancements are paving the way for future developments in display technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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