This inventor holds 1 USPTO granted patent. Top assignee: Panasia Co., Ltd.. Active years: 2014.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2014
Title: Innovations of Chang-Won Lee in Exhaust Gas Treatment
Introduction
Chang-Won Lee is a notable inventor based in Gyeongsangnam-do, South Korea. He has made significant contributions to the field of environmental technology, particularly in the area of exhaust gas treatment. His innovative approach focuses on reducing harmful emissions while also addressing noise pollution.
Latest Patents
Chang-Won Lee holds a patent for an "Exhaust gas denitrifying system having noise-reduction structure." This system is designed to convert nitrogen oxides in exhaust gas into harmless nitrogen through a chemical reaction facilitated by a catalyst. The reactor features a catalytic filter unit that is coated with a catalyst and includes multiple through-holes for exhaust gas passage. Additionally, it incorporates a noise-reducing unit that effectively minimizes noise generated during the denitrification process. This dual functionality not only enhances environmental protection but also optimizes the size of the exhaust gas denitrifying system.
Career Highlights
Chang-Won Lee is currently employed at Panasia Co., Ltd., where he continues to develop innovative solutions for environmental challenges. His work has garnered attention for its practical applications and effectiveness in reducing emissions.
Collaborations
Chang-Won Lee collaborates with talented colleagues, including Soo-Tae Lee and Ok-Ryeol Song, who contribute to the advancement of their projects and innovations.
Conclusion
Chang-Won Lee's contributions to exhaust gas treatment exemplify the importance of innovation in addressing environmental issues. His patented technology not only improves air quality but also reduces noise pollution, showcasing a comprehensive approach to modern engineering challenges.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
