Company Filing History:
Years Active: 2021
Title: Chang Sup Mun: Innovator in Wet Etching Technology
Introduction
Chang Sup Mun is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of wet etching systems, which are crucial in various manufacturing processes, particularly in the semiconductor industry. His innovative approach has led to the development of a unique operating method that enhances the efficiency of etching processes.
Latest Patents
Chang Sup Mun holds a patent for an "Operating method for wet etching system and related system." This patent describes a method that includes providing an etching apparatus with an N etching solution, loading N batch substrates into the apparatus, and performing an N etching process. The method also involves discharging some of the N etching solution, refilling the apparatus with an (N+1) etching solution, and loading (N+1) batch substrates for the subsequent etching process. The (N+1) etching solution is characterized by its temperature and concentration management, ensuring optimal performance during the etching process. He has 1 patent to his name.
Career Highlights
Chang Sup Mun is currently employed at Samsung Electronics Co., Ltd., a leading global technology company. His work at Samsung has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in semiconductor manufacturing technologies. His expertise in wet etching systems has positioned him as a valuable asset within the company.
Collaborations
Chang has collaborated with several talented individuals in his field, including Sang Hoon Jeong and Yong Sun Ko. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.
Conclusion
Chang Sup Mun is a distinguished inventor whose work in wet etching technology has made a significant impact on the semiconductor industry. His innovative methods and collaboration with talented colleagues continue to drive advancements in this critical field.