The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 2021
Filed:
Jul. 03, 2019
Samsung Electronics Co., Ltd., Suwon-si, KR;
Sang Hoon Jeong, Hwaseong-si, KR;
Yong Sun Ko, Hwaseong-si, KR;
Dong Ha Kim, Hwaseong-si, KR;
Tae Heon Kim, Hwaseong-si, KR;
Chang Sup Mun, Hwaseong-si, KR;
Woo Gwan Shim, Hwaseong-si, KR;
Jun Youl Yang, Hwaseong-si, KR;
Se Ho Cha, Hwaseong-si, KR;
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;
Abstract
A wet etching system operating method includes providing an etching apparatus having an Netching solution, loading Nbatch substrates into the etching apparatus and performing an Netching process, discharging some of the Netching solution, refilling the etching apparatus with an (N+1)etching solution supplied from a supply apparatus connected to the etching apparatus, and loading (N+1)batch substrates into the etching apparatus and performing an (N+1)etching process, wherein the (N+1)etching solution has a temperature within or higher than a temperature management range of the (N+1)etching process, and wherein the (N+1)etching solution has a concentration within or higher than a concentration management range of the (N+1)etching solution, N being a positive integer.