Chang-sun Hwang

Title: Chang-sun Hwang: Innovator in Phase-Change Memory Technology

Introduction

Chang-sun Hwang is a prominent inventor based in Daejeon, South Korea. He is known for his significant contributions to the field of semiconductor technology, particularly in the development of phase-change memory devices. His innovative work has led to advancements that enhance the performance and efficiency of memory storage solutions.

Latest Patents

Chang-sun Hwang holds a patent for a "Chemical-mechanical polishing method for polishing phase-change material and method of fabricating phase-change memory device using the same." This patent describes a chemical-mechanical polishing (CMP) method that involves forming a phase-change material on a semiconductor wafer's activation surface. The CMP process is designed to reduce changes in the composition of the phase-change material by carefully adjusting the temperature at the contact region between the semiconductor wafer and the polishing pad.

Career Highlights

Hwang is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of technology in the semiconductor industry. His work has been instrumental in developing methods that improve the fabrication processes of advanced memory devices.

Collaborations

Throughout his career, Chang-sun Hwang has collaborated with notable colleagues, including Joon-Sang Park and Chung-Ki Min. These collaborations have fostered an environment of innovation and have contributed to the success of various projects within the company.

Conclusion

Chang-sun Hwang's contributions to the field of phase-change memory technology exemplify the impact of innovative thinking in the semiconductor industry. His work continues to influence advancements in memory storage solutions, showcasing the importance of research and development in technology.