Yongin, South Korea

Chang Seung Lee

This inventor holds 5 USPTO granted patents and 2 published patent applications. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2009-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chang Seung Lee. Retrieved from https://idiyas.com/inventor/chang-seung-lee-u648nx64

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 5 

% Patents Active = 60.0

Average Co-Inventor Count = 6.7

ph-index = 2

Forward Citations = 6(Granted Patents)


Location History:

  • Yongin-si, KR (2009 - 2010)
  • Gyeonggi-do, KR (2018)

Company Filing History:


Years Active: 2009-2025

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5 patents (USPTO):Explore Patents

Title: Chang Seung Lee: Innovator in Resistive Memory and Graphene Technology

Introduction

Chang Seung Lee is a prominent inventor based in Yongin-si, South Korea. He has made significant contributions to the field of electronics, particularly in the development of resistive memory devices and graphene electronic devices. With a total of five patents to his name, Lee continues to push the boundaries of innovation in technology.

Latest Patents

One of his latest patents is for a resistive memory device. This device includes a resistive memory pattern and a selection element pattern that is electrically connected to the resistive memory pattern. The selection element pattern incorporates a chalcogenide switching material and at least one metallic material. The chalcogenide switching material consists of germanium, arsenic, and selenium, while the metallic material includes aluminum, strontium, or indium. Notably, the selection element pattern features an inhomogeneous material layer where the content of the metallic material varies according to its position within the pattern.

Another significant patent by Lee is related to a graphene electronic device and its manufacturing method. This method involves forming a metal compound layer and a catalyst layer on a substrate. The catalyst layer contains a metal element from the metal compound layer, which is crucial for growing a graphene layer. The process also includes converting the catalyst layer into a portion of the metal compound layer, showcasing Lee's innovative approach to graphene technology.

Career Highlights

Chang Seung Lee is currently employed at Samsung Electronics Co., Ltd., where he applies his expertise in electronics and materials science. His work at Samsung has allowed him to collaborate with other talented professionals in the field, further enhancing his contributions to technology.

Collaborations

Some of his notable coworkers include Kae Dong Back and Ki Deok Bae. Their collaborative efforts have likely played a role in advancing the projects they work on together.

Conclusion

Chang Seung Lee is a key figure in the realm of electronic innovations, particularly in resistive memory and graphene technologies. His patents reflect a deep understanding of materials and their applications in modern electronics. Lee's work continues to influence the future of technology, making him a noteworthy inventor in his field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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