Company Filing History:
Years Active: 2004
Title: Chang-Ro Yoon: Innovator in Semiconductor Technology
Introduction
Chang-Ro Yoon is a notable inventor based in Chungcheongnam-do, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in wafer drying methods and apparatuses. With a total of 2 patents, his work has advanced the efficiency and effectiveness of semiconductor processing.
Latest Patents
Chang-Ro Yoon's latest patents include a "Wafer Drying Method" and a "Wafer Drying Apparatus." The wafer drying method involves a series of steps to dry a semiconductor substrate effectively. This process includes clearing the substrate by supplying a liquid into a processing bath, injecting first dry gases onto the surface of the liquid, and draining the liquid to expose the substrate gradually. Additionally, a second dry gas is injected into the chamber to forcibly exhaust gas. The wafer drying apparatus consists of a chamber with a processing bath, a liquid flow system for cleaning the substrate, a gas distributor for drying, and decompression means for exhausting air in the chamber.
Career Highlights
Throughout his career, Chang-Ro Yoon has worked with companies such as Dns Korea Co., Ltd. and Dns Korea, Ltd. His experience in these organizations has allowed him to refine his skills and contribute to innovative solutions in semiconductor technology.
Collaborations
Chang-Ro Yoon has collaborated with notable colleagues, including Jeong-Yong Bae and Pyeng-Jae Park. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies.
Conclusion
Chang-Ro Yoon's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the industry. His innovative methods and apparatuses continue to impact the field positively.