San Antonio, TX, United States of America

Chang-Ou Lee


Average Co-Inventor Count = 3.8

ph-index = 6

Forward Citations = 107(Granted Patents)


Location History:

  • Austin, TX (US) (1996)
  • San Antonio, TX (US) (1994 - 1998)

Company Filing History:


Years Active: 1994-1998

Loading Chart...
8 patents (USPTO):Explore Patents

Title: Chang-Ou Lee: Innovator in Semiconductor Technology

Introduction

Chang-Ou Lee is a prominent inventor located in San Antonio, Texas. He has made significant contributions to the field of semiconductor technology, holding a total of eight patents. His innovative work has had a lasting impact on integrated circuit design and manufacturing processes.

Latest Patents

Among his latest inventions are two notable patents that enhance the performance and reliability of semiconductor devices. The first patent focuses on the formation of titanium boride and titanium silicide contact barriers. This method involves depositing titanium using a low-pressure chemical-vapor deposition process, which provides excellent step coverage over integrated circuit structures. A rapid thermal anneal, performed in an ambient containing diborane, enables the titanium to interact with underlying silicon, forming titanium silicide. Meanwhile, diborane reacts with titanium to create titanium boride, resulting in a composite barrier layer. This innovative barrier prevents aluminum migration into silicon while also lowering contact resistivity, ultimately enhancing thermal stability due to the compatibility of thermal coefficients of expansion.

The second patent presents an improved anneal process for preparing dielectric layers, particularly intermetal dielectric layers. This process involves the deposition of an oxide layer using a H2O-TEOS PECVD method, followed by a vacuum bake to remove volatile impurities. An oxidation anneal is then achieved to scavange any remaining undesirables and densify the dielectric layer, ensuring high performance in multi-level metal interconnect structures.

Career Highlights

Chang-Ou Lee works at VLSI Technology, Inc., a company renowned for its advancements in semiconductor technology. His dedication to innovation and excellence has earned him recognition in the industry. With his eight patents, he has played a vital role in pushing the boundaries of semiconductor manufacturing techniques.

Collaborations

Throughout his career, Chang-Ou has collaborated with esteemed colleagues, including Felix H. Fujishiro and Landon B. Vines. These partnerships highlight the collaborative nature of innovation in the technology sector, where teamwork often leads to groundbreaking discoveries and advancements.

Conclusion

Chang-Ou Lee exemplifies the spirit of innovation in the semiconductor industry. His contributions through numerous patents have significantly advanced technologies that are vital to modern electronics. As a dedicated inventor, he continues to inspire future generations of engineers and researchers in their pursuit of novel solutions within the realm of semiconductor technology.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…