Chung Ho, Taiwan

Chang-Lung Hsieh


Average Co-Inventor Count = 9.0

ph-index = 1


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Chang-Lung Hsieh

Introduction

Chang-Lung Hsieh, an accomplished inventor from Chung Ho, Taiwan, has made significant strides in the field of environmental technology. His innovative approach to waste management has led to the development of a unique method that not only addresses waste disposal concerns but also enhances environmental safety.

Latest Patents

Hsieh holds a patented invention titled "Method of using high temperature plasma to disintegrate waste containing titanyl phthalocyanine." This patent describes a groundbreaking method wherein a mixture of titanyl phthalocyanine (TiOPc), a vitrifying material, and optionally selected waste soil is heated to extremely high temperatures ranging from 1,220°C to 10,000°C. During this process, the mixture transforms into a molten lava state, allowing the plasma to effectively break down the harmful components of TiOPc. As a result, this process encases the benign by-products in a chemically stable lava, thereby eliminating the environmental threats posed by TiOPc.

Career Highlights

Hsieh's professional journey includes notable contributions while working at companies such as Labeltek Inc. and Tai Chan Environmental Technologies Ltd. His extensive experience in these organizations has allowed him to hone his skills and focus on developing innovative solutions in waste management.

Collaborations

Throughout his career, Chang-Lung Hsieh has collaborated with talented individuals including Yu-Ting Shen and Chih-Wei Kuo. Together, they have worked toward advancing environmental technologies, demonstrating the importance of teamwork in driving innovation.

Conclusion

Chang-Lung Hsieh stands out as a pioneer in employing high temperature plasma technology for environmental applications. His patented method represents a significant leap forward in waste disposal techniques, aligning with global efforts to enhance sustainability. Through his work, Hsieh not only contributes to technological advancements but also promotes a cleaner and healthier environment for future generations.

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