Taiyuan, China

Chang Liu

This inventor holds 1 USPTO granted patent. Top assignee: Taiyuan University of Science and Technoloy. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chang Liu. Retrieved from https://idiyas.com/inventor/chang-liu-lfs6uv9r

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Chang Liu and Secure RIS-NOMA Communication

Introduction

Chang Liu is an inventor based in Taiyuan, China, and is associated with Taiyuan University of Science and Technology. His patent work addresses secure wireless communication under complex channel conditions.

Latest Patents

Liu is credited with 1 patent: “Wireless Secure Communication Method Using Reconfigurable Intelligent Surface–Non-Orthogonal Multiple Access Under Complex Channel Conditions.” The method considers a reconfigurable intelligent surface positioned between a base station, legitimate NOMA users, and potential eavesdroppers. It evaluates signal-to-interference-plus-distortion-noise ratios in the presence of residual hardware impairments, approximates shadow-fading distributions to simplify analysis, and calculates outage and interception probabilities for legitimate users and eavesdroppers.

Career Highlights

Liu’s listed invention combines reconfigurable intelligent surfaces with non-orthogonal multiple access to analyze wireless security in challenging channel environments. His affiliation with Taiyuan University of Science and Technology connects this work to an academic research setting.

Collaborations

Meiling Li and Ruifen Ma are identified as Liu’s coworkers. The available information does not specify their roles in the patent or the extent of their collaboration.

Conclusion

Chang Liu’s patent focuses on evaluating secure RIS-NOMA communication by modeling hardware impairments and shadow fading, with the aim of assessing risks to legitimate users and potential eavesdroppers.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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