This inventor holds 1 USPTO granted patent. Top assignee: Industrial Technology Research Institute. Active years: 2012.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2012
Title: Innovations of Chang-Hsiung Chen
Introduction
Chang-Hsiung Chen is a notable inventor based in Taichung, Taiwan. He has made significant contributions to the field of measurement technology, particularly with his innovative devices designed to enhance precision in resilience and displacement measurements.
Latest Patents
Chang-Hsiung Chen holds a patent for a "Resilience and displacement measuring device and method." This device is equipped with a shaft that features both a displacement detection module and a force detection module at its ends. The device operates by moving the shaft to drive a probe that presses on a tested press-key. As the shaft moves, a reflective panel in the displacement detection module displaces, allowing a light sensor to measure the shaft's displacement. Simultaneously, the probe's pressing action deforms a detection film, enabling a strain gauge to measure resilience. This innovative device can divide measurement ranges into multiple sub-ranges, allowing for precise calculations based on the measured distance information.
Career Highlights
Chang-Hsiung Chen is affiliated with the Industrial Technology Research Institute, where he continues to develop and refine his inventions. His work focuses on creating advanced measurement devices that improve accuracy and efficiency in various applications.
Collaborations
Chang-Hsiung Chen has collaborated with notable colleagues, including Chung-Chien Chiang and Hsing-Cheng Chang. Their combined expertise contributes to the advancement of technology in their field.
Conclusion
Chang-Hsiung Chen's innovative contributions to measurement technology exemplify the impact of dedicated inventors in enhancing precision and efficiency. His work continues to influence the industry and inspire future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
