Company Filing History:
Years Active: 2025
Title: Chang-Hsiu Wu: Innovator in Semiconductor Technology
Introduction
Chang-Hsiu Wu is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, showcasing his expertise through his innovative patents. His work is particularly recognized for its impact on the efficiency and functionality of semiconductor devices.
Latest Patents
Chang-Hsiu Wu holds a patent for a semiconductor device that includes a semiconductor stack, a third semiconductor structure, a dielectric layer, and a reflective layer positioned beneath the third semiconductor structure. The semiconductor stack comprises a first semiconductor structure, an active structure, and a second semiconductor structure. The first semiconductor structure features a first surface that is divided into a first portion and a second portion, with the first surface having a defined first area. The third semiconductor structure connects to the first portion and possesses a second surface with a second area. The dielectric layer is linked to the second portion and contains multiple openings, which collectively have a third area. Notably, the ratio of the second area to the first area is maintained between 0.1 and 0.7, while the ratio of the third area to the first area is less than 0.2.
Career Highlights
Chang-Hsiu Wu is currently employed at Epistar Corporation, a leading company in the semiconductor industry. His role at Epistar has allowed him to further develop his skills and contribute to groundbreaking advancements in semiconductor technology.
Collaborations
Chang-Hsiu Wu has collaborated with talented coworkers such as Chun-Yu Lin and Jun-Yi Li. These collaborations have fostered an environment of innovation and creativity, leading to the development of advanced semiconductor solutions.
Conclusion
Chang-Hsiu Wu's contributions to semiconductor technology through his innovative patent exemplify his dedication to advancing the field. His work at Epistar Corporation and collaborations with fellow inventors highlight the importance of teamwork in driving technological progress.