Chang Hee Shin

Title: Chang Hee Shin: Innovator in Plasma Processing Technology

Introduction

Chang Hee Shin is a notable inventor based in Milpitas, CA (US). He has made significant contributions to the field of plasma processing technology. His innovative work has led to the development of a unique reactor design that enhances the uniformity of large-area VHF plasma processing.

Latest Patents

Chang Hee Shin holds 1 patent for his invention titled "Reactor design for large-area VHF plasma processing with improved uniformity." This patent describes an apparatus for plasma processing of substrates. The invention features a plasma processing chamber that includes a chamber body and a lid. The lid is equipped with a faceplate coupled to a backing plate, both of which are situated within a processing volume defined by the chamber body and the lid. Additionally, one or more ferrite blocks are attached to the backing plate to modulate an electromagnetic field generated by an RF current from an RF generator. A gas feed assembly, which includes a gas source, a remote plasma source, and a zero field feed through, is also integrated into the design, ensuring fluid communication with the processing volume.

Career Highlights

Chang Hee Shin is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His work at Applied Materials has allowed him to focus on advancing plasma processing technologies, which are crucial for various applications in electronics manufacturing.

Collaborations

Throughout his career, Chang Hee Shin has collaborated with esteemed colleagues, including Shuran Sheng and Shinobu Abe. These collaborations have contributed to the advancement of innovative technologies in the field.

Conclusion

Chang Hee Shin's contributions to plasma processing technology exemplify his dedication to innovation and excellence. His patent and work at Applied Materials, Inc. highlight his role as a key figure in advancing the capabilities of plasma processing systems.