Yongin, South Korea

Chang-Dol Kim

This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignee: Eugene Technology Co., Ltd.. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chang-Dol Kim. Retrieved from https://idiyas.com/inventor/chang-dol-kim-bj1ui69v

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Chang-Dol Kim: Innovator in Substrate Processing Technology

Introduction

Chang-Dol Kim is a notable inventor based in Yongin-si, South Korea. He has made significant contributions to the field of substrate processing technology. His innovative approach has led to the development of a unique substrate treatment apparatus.

Latest Patents

Chang-Dol Kim holds 1 patent for his invention titled "Substrate Treatment Apparatus." This apparatus includes a chamber body with a passage for substrate transfer, an inner reaction tube for processing, and a substrate holder that moves between stacking and processing positions. The design also features a blocking plate and connection cylinder to ensure effective isolation during the processing of substrates.

Career Highlights

Throughout his career, Chang-Dol Kim has demonstrated a commitment to advancing substrate processing technologies. His work at Eugene Technology Co., Ltd. has positioned him as a key player in the industry. His innovative designs have the potential to enhance efficiency and effectiveness in substrate treatment processes.

Collaborations

Chang-Dol Kim has collaborated with talented coworkers, including Jun-Jin Hyon and Byoung-Gyu Song. Their combined expertise contributes to the innovative environment at Eugene Technology Co., Ltd.

Conclusion

Chang-Dol Kim's contributions to substrate processing technology exemplify the spirit of innovation. His patent for the substrate treatment apparatus showcases his ability to address complex challenges in the field. His work continues to influence advancements in substrate processing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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