Company Filing History:
Years Active: 2008
Title: Innovations by Chandra Saravanan
Introduction
Chandra Saravanan is an accomplished inventor based in Fremont, CA. He has made significant contributions to the field of residue detection systems, showcasing his expertise through his innovative patent.
Latest Patents
Chandra holds a patent for a system that characterizes residue on a sample. This residue detection system collects at least one spectrum and image from a measurement region on a sample. Spectral analysis is performed on the collected spectrum to determine whether residue is present and, if so, the thickness of the residue. The spectral analysis utilizes a calibration metric that correlates a monitoring parameter to the thickness of the residue. The monitoring parameter includes the reflectance value at one or more local minima and maxima in the spectrum, the shape of these local minima and maxima, and the difference in reflectance values between at least two of the local minima and maxima. In one embodiment, imaging analysis is conducted on the collected image of the measurement region if no residue is detected by the spectral analysis.
Career Highlights
Chandra is currently employed at Nanometrics Inc., where he continues to develop and refine his innovative technologies. His work has positioned him as a key player in the advancement of residue detection systems.
Collaborations
Chandra collaborates with talented individuals such as Zhuan Liu and Sangbong Lee, contributing to a dynamic and innovative work environment.
Conclusion
Chandra Saravanan's contributions to the field of residue detection systems exemplify his innovative spirit and dedication to advancing technology. His patent reflects a significant step forward in the ability to analyze and characterize residues effectively.