Chandan Kr Barik

Title: Chandan Kr Barik: Innovator in Silicon Nitride Deposition

Introduction

Chandan Kr Barik is a notable inventor based in West Bengal, India. He has made significant contributions to the field of materials science, particularly in the deposition of silicon nitride films. His innovative work has led to the development of a unique patent that enhances the efficiency of silicon nitride deposition processes.

Latest Patents

Chandan holds a patent for "Chalcogen precursors for deposition of silicon nitride." This patent describes chalcogen silane precursors and methods for depositing a silicon nitride (SiN) film on a substrate. The process involves exposing the substrate to the chalcogen silane and a reactant to deposit the silicon nitride film. The exposures can be either sequential or simultaneous, and the chalcogen silane may be substantially free of halogen. The chalcogen can be selected from sulfur (S), selenium (Se), and tellurium (Te). This innovation represents a significant advancement in the field of semiconductor manufacturing.

Career Highlights

Chandan is currently employed at Applied Materials, Inc., a leading company in the semiconductor and materials engineering industry. His work at Applied Materials has allowed him to apply his innovative ideas in a practical setting, contributing to the advancement of technology in the field.

Collaborations

Chandan has collaborated with notable colleagues, including Michael G Haverty and Muthukumar Kaliappan. These collaborations have fostered a productive environment for innovation and have led to further advancements in their respective fields.

Conclusion

Chandan Kr Barik is a distinguished inventor whose work in silicon nitride deposition has the potential to impact the semiconductor industry significantly. His innovative approach and collaboration with esteemed colleagues highlight his commitment to advancing technology.