Loudonville, NY, United States of America

Chan Seob Cho

This inventor holds 2 USPTO granted patents. Top assignee: Globalfoundries Inc.. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chan Seob Cho. Retrieved from https://idiyas.com/inventor/chan-seob-cho

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2016

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2 patents (USPTO):Explore Patents

Title: Innovations of Chan Seob Cho

Introduction

Chan Seob Cho is a notable inventor based in Loudonville, NY (US). He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approach to solving complex engineering challenges.

Latest Patents

One of his latest patents is titled "Overlay mark dependent dummy fill to mitigate gate height variation." This patent describes a method of forming dummy structures and an overlay mark protection zone over an active layer zone based on the shape of an overlay mark. The process involves determining the size and shape of the overlay mark, as well as the protection zone and dummy structures. It also includes forming the active layer zone in a semiconductor substrate and planarizing the poly layer.

Career Highlights

Chan Seob Cho is currently employed at GlobalFoundries Inc., a leading semiconductor manufacturer. His work focuses on enhancing the performance and reliability of semiconductor devices through innovative design techniques.

Collaborations

Throughout his career, Chan has collaborated with talented individuals such as Guoxiang Ning and Paul Willard Ackmann. These collaborations have contributed to the advancement of technology in the semiconductor industry.

Conclusion

Chan Seob Cho's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the field. His innovative methods continue to shape the future of semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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